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Semiconductor equipment / Product Center
Automatic wafer thinning machine
Automatic wafer thinning machine

[ Equipment introduction ]

● Used for thinning the back of 300mm wafer

● Two sand wheel shafts, no need to replace the grinding wheel to complete rough grinding and fine grinding

 

Product details

[ Main features ]

● Automatically complete the process of taking, centering, wetting, rough grinding, fine grinding, unloading, cleaning and drying, loading

● With automatic thickness compensation, grinding wheel automatic knife and other functions

● Both the grinding wheel spindle and the workpiece spindle adopt high-precision and high-stiffness aerostatic bearings

● Man-machine user control screen can synchronously display processing status and equipment status

 

[ The main parameters ]

Dimension of grinding wafers: ∅300mm

Sand wheel spindle type: qi floating spindle

Number of sand wheel spindles: 2

Sand wheel spindle speed: 1000 ~ 4000RPM

Z axis itinerary: 130mm

Z axis grinding speed: 0.0001 ~ 0.08mm/s

Z -axis minimum amount of feed: 0.1 μm

Wall thickness measurement range: 0 ~ 1800 μm

Thickness measurement resolution: 0.1 μm

Number of wafers: 3

Walls Workbench Speed: 0 ~ 300RPM

Sand wheel diameter: ∅300mm

Number of wafers: 2

Wall treatment: flushing and drying

After grinding, wafers ttv: ≤1.5μm

Disginal deviation between the tape after grinding: 3 μm

Uph: 20-30Pcs/H

Surface roughness: Ra≤10nm, Ry0.1μm

 

[ Example Effect ]

The grinding 300mm wafer 

 

Before thinning——After thinning

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